氫氣干燥裝置說(shuō)明翻譯-中英對(duì)照
1．經(jīng)處理后產(chǎn)品氫應(yīng)達(dá)到下述要求：
濕度：露點(diǎn)－500C 溫度：400C ` 純度：99.9%
2．規(guī)范：
處理容量： 5Nm3/hr
工作壓力： 3.2MPa
再生方式： 電加熱
四．氫氣貯存罐：
1．容積： 13.9m3
2．工作壓力： 3.0MPa
3．材質(zhì)： 16MnR
4．?dāng)?shù)量： 3臺(tái)
五．壓縮空氣貯存罐：
1．容積： 6.0m3
2．工作壓力： 0.8MPa
3．材質(zhì)： 16MnR
4．?dāng)?shù)量： 1臺(tái)
六．除鹽水冷卻裝置：
1．除鹽水箱
容積： 2.0m3
材質(zhì)： 不銹鋼
數(shù)量： 1臺(tái)
2．循環(huán)水泵
型式： 臥式離心泵
過流部分材質(zhì)： 不銹鋼
數(shù)量： 2臺(tái)
3．海水過濾器
過濾精度： 0.1mm
本體材質(zhì)： 鋼襯膠
濾網(wǎng)材質(zhì)： 聚丙烯
數(shù)量： 1臺(tái)
4．熱交換器
數(shù)量： 2臺(tái)
5．裝置范圍內(nèi)的主要管道：
換熱器出口除鹽水管
材質(zhì): 不銹鋼
規(guī)格： 45x2.5
第三節(jié) 系統(tǒng)的運(yùn)行
一．制氫設(shè)備的初啟動(dòng)：
1．配制電解液：
取適量工業(yè)純氫氧化鉀，放入溶堿箱內(nèi)。
向堿箱內(nèi)加除鹽水，攪拌均勻，分析此氫氧化鈉溶液的濃度，并控制在20%--25%的范圍內(nèi)。
向配制好的氫氧化鉀溶液中加入已溶解成溶液的重鉻酸鉀使其濃度為0.2%作為緩蝕劑。
重鉻酸鉀應(yīng)先用除鹽水溶解成溶液后，才可倒入堿溶液箱內(nèi)，再次攪拌均勻，電解液配制完畢。
配制好的電解液應(yīng)沉淀24小時(shí)后方可使用。
2．向電解槽內(nèi)加電解液：利用堿液循環(huán)泵將堿液送至電解槽。
3．向系統(tǒng)加水：利用補(bǔ)水泵，向氫洗滌器加水，同時(shí)要注意氫氧分離器水位。
4．用氮?dú)獯禋湎到y(tǒng)：用氮?dú)獯禋浞蛛x器至氫出口間的管道。
5．氫大罐注水：
將除鹽水管用橡膠軟管與氫大罐底部排水門連接好。
打開大罐頂部排氣門。
向大罐進(jìn)水至頂部有水排出為止，并加堵板。
啟動(dòng)電器設(shè)備，開始向氫大罐進(jìn)氫。
三．制氫設(shè)備的正常啟動(dòng)：
1．設(shè)備的檢查：檢查電器設(shè)備周圍清潔無(wú)雜物，可正常備用；氫氧分離器的水位正常，如相差大，可用氧側(cè)手動(dòng)排空門調(diào)節(jié)。
2．啟動(dòng)除鹽水冷卻裝置。
3．啟制氫裝置，控制系統(tǒng)將自動(dòng)進(jìn)行。
四．制氫設(shè)備的停運(yùn)：
1．停制氫設(shè)備，控制系統(tǒng)將自動(dòng)進(jìn)行。
2．確認(rèn)制氫系統(tǒng)停運(yùn)正常后，停除鹽水冷卻系統(tǒng)。
第四節(jié) 制氫站安全技術(shù)措施
1．制氫站的全體工作人員必須遵守《電業(yè)安全規(guī)程》（熱力機(jī)械部分）（發(fā)電廠和變電所電氣部分）的有關(guān)規(guī)程
2．制氫設(shè)備帶壓時(shí)禁止檢修工作，必須工作時(shí)，應(yīng)有安全措施。
3．制氫設(shè)備不允許超壓，嚴(yán)禁負(fù)壓運(yùn)行。
4．禁止與工作無(wú)關(guān)人員進(jìn)入制氫間及干燥間，工作人員不準(zhǔn)穿帶釘子的鞋。
5．新安裝和大修后的氫氣系統(tǒng)必須做耐壓試驗(yàn)及清洗置換后才能投入使用
6．制氫站及氫氣運(yùn)行現(xiàn)場(chǎng)應(yīng)懸掛“氫氣運(yùn)行，嚴(yán)禁煙火”標(biāo)示牌，并按規(guī)定備有必要數(shù)量的消防器材。
7．電解槽運(yùn)行時(shí)禁止兩只手分別接觸兩個(gè)不同電極
8．配制或抽電解液時(shí)，應(yīng)背風(fēng)站立。同時(shí)應(yīng)戴膠手套、穿深筒膠靴及佩戴防護(hù)眼鏡。
9．電解槽及氫氣管道檢修時(shí)應(yīng)先用氮?dú)饣蚨趸贾脫Q合格后方可檢修。
10．制氫氣設(shè)備維護(hù)應(yīng)使用專用工具，使用一般工具時(shí)，應(yīng)涂上黃油。
11．在制氫站內(nèi)或氫冷設(shè)備上動(dòng)火時(shí)，應(yīng)嚴(yán)格履行廠動(dòng)火工作票制度。
12．氫氣管道、閥門和水封等裝置凍結(jié)時(shí)，只能用熱水蒸氣加熱解凍，嚴(yán)禁使用明火解凍。
13．設(shè)備、管道及閥門連接點(diǎn)泄漏檢查，可用肥皂水或檢漏儀進(jìn)行檢測(cè)，嚴(yán)禁使用明火找漏。
14．排放或儲(chǔ)存帶有壓力的氫氣或氧氣時(shí)，禁止劇烈排放，應(yīng)緩慢打開閥門控制流量以防摩擦自燃發(fā)生意外事故
15．嚴(yán)禁氫氧氣混合防止爆鳴氣體產(chǎn)生
16．氫氣系統(tǒng)發(fā)生火災(zāi)時(shí)應(yīng)保證系統(tǒng)正壓狀態(tài)，以防回火擴(kuò)大事故。同時(shí)注意氫氣火焰不易察覺，救護(hù)人員應(yīng)防止外露皮膚燒傷。
17．當(dāng)電解槽系統(tǒng)大量堿液外漏時(shí)，應(yīng)降低壓力，減少堿液外漏量，同時(shí)注意堿液傷害。
V. Operation of second class hyperfiltration system:
1. System startup:
●Open the water gate and discharging gate of water production; closes discharging gate of the fortified flow;
●Open the water gate and discharging gate of the fortified flow;
●Open the water gate and discharging gate of water production; startup the high-pressure pump;
2. Systems operation: When water flow is qualified, close the discharging gate of water production and the system run into operation;
3. Shut down the system:
●Open the discharging gate of the fortified flow;
●Close the water gate; open discharging gate of the fortified flow; close the high-pressure pump;
●Open the flushing water gate; start flushing water pump;
●Maintain for a proper period, stop flushing water pump, close the flushing water gate, discharging gate of the fortified flow and discharging gate of the
fortified flow; the system changes to the backup mode;
VI. Filter backwash:
1. Backwash of multi-medium filter:
Close the water gate when it is qualified; the lower discharging gate filter changes to the backup mode;
2. Backwash of activated charcoal filter:
●Back washing: open backwash gate, upper discharging gate; start backwash water pumps, control the backwash flow to prevent the leakage of filtering
materials;
●Static: stop the backwash pump for a proper period and close the backwash gate;
●Direct flushing: open the water gate for a proper period; close the discharging gate when the water flow out; open the lower discharging gate; close the
water inlet gate when the quality of water leakage water is qualified; the filter of lower discharging gate changes to the backup mode;
3. Program control schedule of multi-medium filter system:
No. Operation
Process
Valve condition Revolution equipment condition Time
Feed
Valve Discharging
Valve Backwashing
Valve Upper discharging
Valve Lower discharging
Valve Air admission
Valve Raw
Water
Valve Backwashing
Valve Root’s air blower min
1 Water production Direct flushing ○ ○ ○ 5
Water production ○ ○ ○
2 Back washing Discharging water ○ ○ ○
Gas Flushing ○ ○ ○ ○ 3
Backwashes ○ ○ ○ ○ 10
Stewing ○ 3
Direct flushing ○ ○ ○ 20
3 Shut down Shut down ○
4 Backup Backup
Note “○”means the valve is opened or pump is in a open condition; the time parameter above may be adjusted in case of debugging.
4. Program control schedule of activated charcoal filter system:
No. Operation
Process
Valve condition Revolution equipment condition Time
Feed
Valve Discharging
Valve Backwashing
Valve Upper discharging
Valve Lower discharging
Valve Raw
Water
Valve Backwashing
Valve min
1 Water production Direct flushing ○ ○ ○ 5
Water production ○ ○ ○
2 Backwashing Backwashing ○ ○ ○ ○ 15
Stewing ○ 3
Disingrect flu ○ ○ ○ 30
3 Shut down Shut down
4 Backup Backup
Note “○”means the valve is opened or pump is in a open condition; the time parameter above may be adjusted in case of debugging.
7. Flushing and clean of hyperfiltration system:
1. Hyperfiltrations systems flushing: The flushing process of sea water hyperfiltration system is the same with the description of item c. d and e of 4.3.⑷
The flushing process of second class hyperfiltrations systems flushing is the same with the description of item c and d of 5.3;
2. Hyperfiltrations systems cleaning:
⑴. Cleaning condition of hyperfiltration system:
a. The pressure difference membrane part surpasses the initial pressure difference about 10%;
b. The continuous desalinization rate of hyperfiltration device reduce 10% above compared to the initial value
c. The hyperfiltration device shall be suspended for quite a long time;
d. The fresh water production of hyperfiltration device reduces 10% above;
⑵. General characteristic of hyperfiltration membrane pollution:
Phenomenon
Materials Salty transmissibility Differential pressure Water production
Metal oxide Increase quickly Increase quickly Reduce rapidly
Calcium carbonate Reduce rapidly Increase gradually Reduce slightly
Calcium carbonate Increase Increase Reduce slightly
Colloidal substance Increase slowly Increase slowly Reduce slowly
Organic matter Increase the speed to be quick Increase slowly Reduce slowly
Microorganism Increase Increase Reduce
⑶. Choices of membrane cleaning solution:
Material
Cleaning solution Sulfate deposits Carbonate deposits Metal oxide Inorganic colloid Silicon Microorganism Organic
0.1%NaOH
0.1%EDTA-Na Applicable
Applicable Best Applicable
0.1%NaOH
0.05%Na-DDS
Good Good
1.0%STP
1.0%TSP
1.0%EDTA-Na
Good Good
0.2%HCl
Best 0.5%H3PO 4
Applicable Applicable 2.0% citric acid
Applicable 0.2%NH2SO3H
Applicable Applicable 1.0%Na2S2O4
Good
Note:
Na-DDS is lauryl sodium sulfate; STP is sodium tripolyphosphate; TSP is trisodium phosphate.
⑷.Shut down protection of hyperfiltration device:
a. After hyperfiltration shut down, it is required to carry out the low pressure flush process without the content anti-sludging agent for 15-20 minute.
b. When the downtime of hyperfiltration device is more than 7 days, it is required to apply the following measure for protection;
1) Formaldehyde protection:
Flush the system with 0.5%-0.7% formaldehyde solution (adjust the PH value to 5-6 with hydrochloric acid); when the formaldehyde content of fortifiedsolution is about 0.5%, the flushing process shall be ended; close all gate of inlet and outlet passage. This measure requires changing the protection fluidevery month.
武漢翻譯公司
2013.7.19